The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 2022

Filed:

May. 28, 2020
Applicant:

Yangtze Memory Technologies Co., Ltd., Wuhan, CN;

Inventors:

Linchun Wu, Wuhan, CN;

Shan Li, Wuhan, CN;

Zhiliang Xia, Wuhan, CN;

Kun Zhang, Wuhan, CN;

Wenxi Zhou, Wuhan, CN;

Zongliang Huo, Wuhan, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11582 (2017.01); H01L 21/8234 (2006.01); H01L 29/417 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11582 (2013.01); H01L 21/823487 (2013.01); H01L 29/41741 (2013.01);
Abstract

Embodiments of 3D memory devices and methods for forming the same are disclosed. In an example, a 3D memory device includes a P-type doped region of a substrate, an N-type doped semiconductor layer on the P-type doped region, a memory stack including interleaved conductive layers and dielectric layers on the N-type doped semiconductor layer, a channel structure extending vertically through the memory stack and the N-type doped semiconductor layer into the P-type doped region, an N-type doped semiconductor plug extending vertically into the P-type doped region, and a source contact structure extending vertically through the memory stack to be in contact with the N-type doped semiconductor plug.


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