The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2021
Filed:
Nov. 22, 2019
Lam Research Ag, Villach, AT;
Rainer Obweger, Villach, AT;
Andreas Gleissner, Villach, AT;
Thomas Wirnsberger, Villach, AT;
Franz Kumnig, Villach, AT;
Alessandro Baldaro, Villach, AT;
Christian Thomas Fischer, Villach, AT;
Mu Hung Chou, Villach, AT;
Rafal Ryszard Dylewicz, Villach, AT;
Nathan Lavdovsky, Villach, AT;
Ivan L. Berry, III, Amesbury, CA (US);
Lam Research AG, Villach, AT;
Abstract
A device for processing wafer-shaped articles comprises a closed process chamber that provides a gas-tight enclosure. A rotary chuck is located within the closed process chamber. A heater is positioned relative to the chuck so as to heat a wafer shaped article held on the chuck from one side only and without contacting the wafer shaped article. The heater emits radiation having a maximum intensity in a wavelength range from 390 nm to 550 nm. At least one first liquid dispenser is positioned relative to the chuck so as to dispense a process liquid onto a side of a wafer shaped article that is opposite the side of the wafer-shaped article facing the heater.