The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2021
Filed:
Feb. 24, 2020
Applicant:
Tessera, Inc., San Jose, CA (US);
Inventors:
John C. Arnold, North Chatham, NY (US);
Anuja E. DeSilva, Slingerlands, NY (US);
Nelson M. Felix, Briarcliff Manor, NY (US);
Chi-Chun Liu, Altamont, NY (US);
Yann A. M. Mignot, Slingerlands, NY (US);
Stuart A. Sieg, Albany, NY (US);
Assignee:
Tessera, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/033 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01); H01L 29/66 (2006.01); H01L 21/8234 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0338 (2013.01); H01L 21/0332 (2013.01); H01L 21/0335 (2013.01); H01L 21/0337 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/3088 (2013.01); H01L 21/31122 (2013.01); H01L 21/31144 (2013.01); H01L 21/32137 (2013.01); H01L 21/823431 (2013.01); H01L 29/6656 (2013.01); H01L 29/66795 (2013.01); Y10S 438/947 (2013.01); Y10S 438/95 (2013.01);
Abstract
Methods of forming fins include masking a region on a three-color hardmask fin pattern, leaving a fin of a first color exposed. The exposed fin of the first color is etched away with a selective etch that does not remove fins of a second color or a third color. The mask and all fins of a second color are etched away. Fins are etched into a fin base layer using the fins of the first color and the fins of the third color.