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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11170969 B1

PDFFull Text
Date of Patent:
Nov. 09, 2021

Filed:

Mar. 30, 2018

Electron beam observation device, electron beam observation system, and control method of electron beam observation device

Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Koichi Hamada, Tokyo, JP;

Megumi Kimura, Tokyo, JP;

Momoyo Enyama, Tokyo, JP;

Ryou Yumiba, Tokyo, JP;

Makoto Sakakibara, Tokyo, JP;

Kei Sakai, Tokyo, JP;

Satoru Yamaguchi, Tokyo, JP;

Katsumi Setoguchi, Tokyo, JP;

Assignee:

HITACHI HIGH-TECH CORPORATION, Tokyo, JP;

Attorney:

Miles & Stockbridge, P.C.

Primary Examiner:

Kiet T Nguyen

Int. Cl.
CPC ...
H01J 37/22 (2006.01); H01J 37/10 (2006.01); H01J 37/153 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); H01J 37/10 (2013.01); H01J 37/153 (2013.01); H01J 37/22 (2013.01); H01J 37/28 (2013.01); H01J 2237/1536 (2013.01); H01J 2237/221 (2013.01);
Abstract

Provided is an electron beam observation device that includes: an electron source; an objective lens concentrating an electron beam emitted from the electron source; and a control unit configured to perform control such that a plurality of images is generated by capturing images of a reference sample having a specific pattern, and a frequency characteristic is calculated for each of the plurality of images, in which an image is generated based on a secondary signal generated from a sample due to irradiation of the sample with the electron beam, and the control unit holds the plurality of frequency characteristics.

Find Patent Forward Citations

Hamada, Koichi. (2021). Electron beam observation device, electron beam observation system, and control method of electron beam observation device (U.S. Patent No. 11170969). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11170969

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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