The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2021
Filed:
Nov. 21, 2019
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Shao-Huan Wang, Hsinchu, TW;
Sheng-Hsiung Chen, Hsinchu, TW;
Fong-Yuan Chang, Hsinchu, TW;
Po-Hsiang Huang, Tainan, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Abstract
A method for outputting a first number of subsets of a layer pattern comprising a plurality of cells arranged in a row includes selecting subsets of cells from the plurality of cells, constructing a graph representation for each subset of cells, identifying graph representations that are not colorable with a first number of labels, identifying subsets of cells that correspond to the identified graph representations, changing a distance between cells in each of the identified subset of cells, wherein the changed distances are greater than the first spacing, labeling the graph representations with the first number of labels, and outputting subsets of the layer pattern to a machine readable storage medium for manufacturing a set of masks that is used to form a single, patterned layer. Each subset of the layer pattern represents a separate mask pattern and includes features of the layer pattern corresponding to a label in the labeled graph representations.