The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2021
Filed:
Jul. 21, 2020
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Yoel Feler, Haifa, IL;
Mark Ghinovker, Yoqneam Ilit, IL;
Evgeni Gurevich, Yoqneam Ilit, IL;
Vladimir Levinski, Migdal HaEmek, IL;
Alexander Svizher, Haifa, IL;
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G02B 27/60 (2006.01); H04N 5/225 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G02B 27/60 (2013.01); H04N 5/2256 (2013.01); G06T 2207/10152 (2013.01); G06T 2207/20216 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A metrology system and metrology methods are disclosed. The metrology system includes an illumination sub-system, a collection sub-system, a detector, and a controller. The controller is configured to receive an image of an overlay target on a sample, determine an apparent overlay between two working zones along a measurement direction based on the image, and calculate an overlay between the two sample layers by dividing the apparent overlay by a Moiré gain to compensate for Moiré interference.