The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2021
Filed:
Oct. 30, 2017
Applicant:
Asml Us, Llc, Chandler, AZ (US);
Inventors:
Assignee:
ASML US, LLC, Chandler, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/36 (2012.01);
U.S. Cl.
CPC ...
G03F 1/36 (2013.01);
Abstract
A method and an apparatus for determining near field images for optical lithography include receiving a thin mask image indicative of a photomask feature, in which the thin mask image is determined without considering a mask topography effect associated with the photomask feature, and determining a near field image from the thin mask image by a processor using an artificial neural network (ANN), in which the ANN uses data of the thin mask image as input. The apparatus includes a processor and a memory coupled to the processor. The memory is configured to store instructions executed by the processor to perform the method.