Yumin Wang

Title: Yumin Wang: Innovator in Optical Lithography

Introduction

Yumin Wang, based in San Jose, CA, is an accomplished inventor known for his contributions to the field of optical lithography. With two patents to his name, his work has significantly advanced the methods used in imaging processes within this critical area of technology.

Latest Patents

Yumin Wang's latest patents focus on simulating near field images in optical lithography. The first patent details a method and apparatus that determines near field images by first receiving a thin mask image indicative of a photomask feature. This thin mask image is derived without taking into account the mask topography effects associated with the feature. Utilizing a processor and an artificial neural network (ANN), the method successfully generates a near field image based on the thin mask image input. The apparatus includes a memory integrated with the processor, designed to store the instructions required for executing the method.

Career Highlights

Throughout his career, Yumin Wang has made significant strides in the optical lithography sector, applying his expertise at notable companies including Xtal, Inc. and ASML US, Inc. His work at these institutions has played a vital role in developing innovative technologies that enhance the capabilities and efficiencies of lithography applications.

Collaborations

Yumin Wang has collaborated with esteemed colleagues in the industry, such as Jiangwei Li and Jun Liu. Their combined expertise furthers the innovative efforts in optical lithography and contributes to the advancement of imaging technologies.

Conclusion

Yumin Wang stands out as a pivotal innovator in the realm of optical lithography. His patents not only showcase his inventive spirit but also highlight the importance of advanced imaging techniques in modern technology. As the field continues to evolve, contributions like those of Yumin Wang are crucial for driving future innovations.