Company Filing History:
Years Active: 2018-2021
Title: Jiangwei Li: Innovator in Optical Lithography
Introduction
Jiangwei Li is a prominent inventor based in San Jose, California, known for his significant contributions to the field of optical lithography. With a total of five patents to his name, he has developed innovative methods and apparatuses that enhance the precision and efficiency of lithographic processes.
Latest Patents
One of Jiangwei Li's latest patents is titled "Simulating Near Field Image in Optical Lithography." This invention involves a method and apparatus for determining near field images for optical lithography. The process includes receiving a thin mask image indicative of a photomask feature, which is determined without considering the mask topography effect associated with the photomask feature. A near field image is then determined from the thin mask image by a processor using an artificial neural network (ANN), which utilizes data from the thin mask image as input. The apparatus comprises a processor and a memory coupled to the processor, with the memory configured to store instructions executed by the processor to perform the method.
Another notable patent is "Application of FreeForm MRC to SRAF Optimization Based on ILT Mask Optimization." This invention discloses a method for extracting shapes from a pixelated SRAF bitmap image of pixels for mask making. The method includes receiving the pixelated SRAF bitmap image, selecting a ridge point in the image, and determining a mask shape using the arrival times of the pixels based on their respective brightness values and a Mask Rule Check (MRC) rule.
Career Highlights
Jiangwei Li has worked with several esteemed companies in the industry, including ASML US, Inc. and Xtal, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in optical lithography.
Collaborations
Throughout his career, Jiangwei Li has collaborated with notable colleagues such as Ke Zhao and Yumin Wang. These partnerships have fostered an environment of innovation and creativity, leading to the development of impactful technologies.
Conclusion
Jiangwei Li's work in optical lithography exemplifies the spirit of innovation and dedication to advancing technology. His patents reflect a deep understanding of complex processes and a commitment to improving the efficiency of lithographic techniques.