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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11071191 B1

PDFFull Text
Date of Patent:
Jul. 20, 2021

Filed:

Jun. 12, 2020

Extreme ultraviolet radiation source and cleaning method thereof

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Chi Yang, Taichung, TW;

Sheng-Ta Lin, Miaoli County, TW;

Shang-Chieh Chien, New Taipei, TW;

Li-Jui Chen, Hsinchu, TW;

Po-Chung Cheng, Zhongpu Shiang, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD, Hsinchu, TW;

Attorney:

McClure, Qualey & Rodack, LLP

Primary Examiner:

Phillip A Johnston

Int. Cl.
CPC ...
H05G 2/00 (2006.01); B08B 5/02 (2006.01); B01D 46/10 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H05G 2/003 (2013.01); B01D 46/106 (2013.01); B08B 5/02 (2013.01); G03F 7/2004 (2013.01); G03F 7/70033 (2013.01); G03F 7/70925 (2013.01); H05G 2/008 (2013.01); B01D 2275/204 (2013.01); B01D 2279/45 (2013.01); H01L 21/0274 (2013.01);
Abstract

An extreme ultraviolet radiation source is provided, including a vessel and a gas scrubber. The vessel has a gas inlet from which a cleaning gas is supplied into the vessel and a gas outlet from which the cleaning gas exits the vessel. The gas scrubber is disposed within the vessel, arranged such that the cleaning gas leaves the vessel through the gas outlet after flowing through the gas scrubber. The gas scrubber has a number of gas passages to allow the cleaning gas to flow through, and the sizes of the gas passages vary according to the distance between each of the gas passages and the gas outlet.

Find Patent Forward Citations

Yang, Chi. (2021). Extreme ultraviolet radiation source and cleaning method thereof (U.S. Patent No. 11071191). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11071191

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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