The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2021
Filed:
Feb. 06, 2019
Asml Netherlands B.v., Veldhoven, NL;
Nitesh Pandey, Eindhoven, NL;
Zili Zhou, Veldhoven, NL;
Gerbrand Van Der Zouw, Waalre, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Markus Gerardus Martinus Maria Van Kraaij, Eindhoven, NL;
Armand Eugene Albert Koolen, Nuth, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Paul Christiaan Hinnen, Veldhoven, NL;
Martinus Hubertus Maria Van Weert, 's-Hertogenbosch, NL;
Anagnostis Tsiatmas, Eindhoven, NL;
Shu-jin Wang, Velhoven, NL;
Bastiaan Onne Fagginger Auer, Eindhoven, NL;
Alok Verma, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.