The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2021
Filed:
Feb. 07, 2019
Asml Netherlands B.v., Veldhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Arno Jan Bleeker, Westerhoven, NL;
Youri Johannes Laurentius Maria Van Dommelen, Eindhoven, NL;
Mircea Dusa, Campbell, CA (US);
Antoine Gaston Marie Kiers, Veldhoven, NL;
Paul Frank Luehrmann, Santa Fe, NM (US);
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Maurits Van Der Schaar, Veldhoven, NL;
Cedric Desire Grouwstra, Eindhoven, NL;
Markus Gerardus Martinus Maria Van Kraaij, Mierlo, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.