The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2021

Filed:

Aug. 21, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Hiranmay Biswas, Kolkata, IN;

Chung-Hsing Wang, Baoshan Township, TW;

Kuo-Nan Yang, Hsinchu, TW;

Jia Han Lin, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/398 (2020.01); G06F 119/18 (2020.01); G03F 7/20 (2006.01); H01L 27/092 (2006.01); H01L 27/02 (2006.01); G06F 30/392 (2020.01);
U.S. Cl.
CPC ...
G06F 30/398 (2020.01); G03F 7/70433 (2013.01); G06F 30/392 (2020.01); G06F 2119/18 (2020.01); H01L 27/0207 (2013.01); H01L 27/0922 (2013.01);
Abstract

A method (of manufacturing a semiconductor device) includes, for a layout diagram stored on a non-transitory computer-readable medium, generating the layout diagram including: populating a row which extends in a first direction with a group of cells, each cell representing a circuit, and first and second side boundaries of each cell being substantially parallel and extending in a second direction which is substantially perpendicular to the first direction; locating, relative to the first direction, cells so that neighboring ones of the cells are substantially abutting; and reducing an aggregate leakage tendency of the group by performing at least one of the following, (A) changing an orientation of at least one of the cells, or (B) changing locations correspondingly of at least two of the cells.


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