The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2021
Filed:
Feb. 25, 2019
Applicant:
United Microelectronics Corp., Hsinchu, TW;
Inventors:
Feng-Chi Chung, Miaoli County, TW;
Ching-Hsing Hsieh, Hsinchu County, TW;
Yi-Chun Lin, Tainan, TW;
Chien-Chuan Yu, Hsinchu, TW;
Assignee:
UNITED MICROELECTRONICS CORP., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 23/02 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G05B 23/0221 (2013.01); G03F 7/70608 (2013.01); G03F 7/70616 (2013.01);
Abstract
A virtual metrology system at least includes a process apparatus including a set of process data, the process apparatus producing a workpiece according to the set of process data. A virtual metrology server is configured to gather the set of process data, cluster the set of process data to obtain data clusters, and compare the data clusters with patterns. If the data clusters meet the patterns corresponding to the data clusters, performing a corresponding maintenance, repair, and overhaul step on the process apparatus.