The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2021
Filed:
Aug. 13, 2019
Asml Netherlands B.v., Veldhoven, NL;
Adrianus Hendrik Koevoets, Mierlo, NL;
Erik Johan Arlemark, Waalre, NL;
Sander Catharina Reinier Derks, Budel, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Wilfred Edward Endendijk, Steensel, NL;
Franciscus Johannes Joseph Janssen, Geldrop, NL;
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Leon Martin Levasier, Hedel, NL;
Jim Vincent Overkamp, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Jacobus Cornelis Gerardus Van Der Sanden, Geldrop, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.