The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2020
Filed:
Nov. 20, 2018
Applied Materials, Inc., Santa Clara, CA (US);
Guoqiang Jian, San Jose, CA (US);
Wei Tang, Santa Clara, CA (US);
Chi-Chou Lin, San Jose, CA (US);
Paul F. Ma, Santa Clara, CA (US);
Kai Wu, Palo Alto, CA (US);
Vikash Banthia, Mountain View, CA (US);
Mei Chang, Saratoga, CA (US);
Jia Ye, San Jose, CA (US);
Wenyu Zhang, San Jose, CA (US);
Jing Zhou, Milpitas, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Methods and apparatus for reducing and eliminating defects in tungsten film are disclosed herein. In the present disclosure, reducing or eliminating oxidation of a first surface of a tungsten film having a predetermined first thickness disposed upon a substrate and within a plurality of trenches is disclosed. The plurality of trenches include a predetermined depth, and a width of less than 20 nanometers. The predetermined first thickness of the tungsten film is substantially uniform throughout the plurality of trenches such that the predetermined first thickness of the tungsten film does not substantially change to a second thickness when the first surface is contacted with air or oxygen.