The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2020

Filed:

Aug. 22, 2018
Applicant:

Versum Materials Us, Llc, Tempe, AZ (US);

Inventors:

Wen Dar Liu, Chupei, TW;

Yi-Chia Lee, Chupei, TW;

Andrew J. Adamczyk, Auburn, AL (US);

Assignee:

VERSUM MATERIALS US, LLC, Tempe, AZ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); C09K 13/06 (2006.01); C09K 13/08 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30604 (2013.01); C09K 13/06 (2013.01); C09K 13/08 (2013.01); H01L 21/0245 (2013.01); H01L 21/02381 (2013.01); H01L 21/02603 (2013.01);
Abstract

Described herein is an etching solution comprising water; oxidizer; water-miscible organic solvent; fluoride ion source; and optionally, surfactant. Such compositions are useful for the selective removal of silicon-germanium over poly silicon from a microelectronic device having such material(s) thereon during its manufacture.


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