The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2020

Filed:

Sep. 19, 2018
Applicants:

Yevgeniy Konstantinovich Shmarev, Lagrangeville, NY (US);

Nitesh Pandey, Eindhoven, NL;

Armand Eugene Albert Koolen, Nuth, NL;

Inventors:

Yevgeniy Konstantinovich Shmarev, Lagrangeville, NY (US);

Nitesh Pandey, Eindhoven, NL;

Armand Eugene Albert Koolen, Nuth, NL;

Assignees:

ASML Holding N.V., Veldhoven, NL;

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/956 (2006.01); G03F 7/20 (2006.01); G01N 21/88 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7065 (2013.01); G01N 21/956 (2013.01); G03F 7/70566 (2013.01); G03F 7/70575 (2013.01); G03F 7/70608 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G03F 7/70683 (2013.01); G01N 21/9501 (2013.01); G01N 2021/8848 (2013.01);
Abstract

An inspection apparatus, including: an objective configured to receive diffracted radiation from a metrology target having positive and negative diffraction order radiation; an optical element configured to separate the diffracted radiation into portions separately corresponding to each of a plurality of different values or types of one or more radiation characteristics and separately corresponding to the positive and negative diffraction orders; and a detector system configured to separately and simultaneously measure the portions.


Find Patent Forward Citations

Loading…