The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2020
Filed:
Sep. 27, 2016
Hitachi High-technologies Corporation, Tokyo, JP;
Toshifumi Honda, Tokyo, JP;
Takahiro Urano, Tokyo, JP;
Hisashi Hatano, Tokyo, JP;
Hironori Sakurai, Tokyo, JP;
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Abstract
A defect class that can identify true information or false information regarding a defect of an inspection target is received, it is determined whether or not the number of true information and the number of false information are insufficient to set a defect extraction parameter of a predetermined region, a feature amount of the defect is extracted in a region other than the predetermined region when it is determined that the number of true information and the number of false information are insufficient, the feature amounts are totalized by adding the feature amount of the defect extracted in a region other than the predetermined region to the feature amount of the defect extracted in the predetermined region, and the totalized feature amount of the defect is displayed for adjustment of the defect extraction parameters.