The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2020
Filed:
Dec. 22, 2017
Mattson Technology, Inc., Fremont, CA (US);
Beijing E-town Semiconductor Technology, Co., Ltd, Beijing, CN;
Shawming Ma, Sunnyvale, CA (US);
Vladimir Nagorny, Tracy, CA (US);
Dixit V. Desai, Pleasanton, CA (US);
Ryan Pakulski, Discovery Bay, CA (US);
MATTSON TECHNOLOGY, INC, Fremont, CA (US);
BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO., LTD., Beijing, CN;
Abstract
Plasma processing with post plasma gas injection is provided. In one example implementation, a plasma processing apparatus includes a plasma chamber. The apparatus includes a processing chamber separated from the plasma chamber. The processing chamber includes a substrate holder operable to support a workpiece. The apparatus includes a plasma source configured to generate a plasma in the plasma chamber. The apparatus includes a separation grid separating the plasma chamber from the processing chamber. The separation grid can be configured to filter one or more ions generated in the plasma and allow the passage of neutral particles from the plasma chamber to the processing chamber. The apparatus can include at least one gas port configured to inject a gas into neutral particles passing through the separation grid.