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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10784342 B1

PDFFull Text
Date of Patent:
Sep. 22, 2020

Filed:

Apr. 16, 2019

Single diffusion breaks formed with liner protection for source and drain regions

Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Wei Hong, Clifton Park, NY (US);

Hong Yu, Clifton Park, NY (US);

Jianwei Peng, Clifton Park, NY (US);

Hui Zhan, Clifton Park, NY (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorneys:

Thompson Hine LLP

Francois Pagette

Primary Examiner:

Hsien Ming Lee

Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/78 (2006.01); H01L 27/088 (2006.01); H01L 21/8234 (2006.01); H01L 21/762 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0653 (2013.01); H01L 21/76224 (2013.01); H01L 21/823431 (2013.01); H01L 21/823481 (2013.01); H01L 27/0886 (2013.01); H01L 29/66795 (2013.01); H01L 29/7851 (2013.01);
Abstract

Structures that include a single diffusion break and methods of forming a single diffusion break. A source/drain region is arranged inside a first cavity in a semiconductor fin, and a dielectric layer is arranged inside a second cavity in the semiconductor fin. A liner, which is composed of a dielectric material, includes a section that is arranged inside the second cavity laterally between the dielectric layer and the source/drain region.

Find Patent Forward Citations

Hong, Wei. (2020). Single diffusion breaks formed with liner protection for source and drain regions (U.S. Patent No. 10784342). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10784342

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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