The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2020
Filed:
Aug. 02, 2018
Applicant:
Asml Netherlands B.v., AH Veldhoven, NL;
Inventors:
Frank Nan Zhang, San Jose, CA (US);
Zhongwei Chen, San Jose, CA (US);
Yixiang Wang, Fremont, CA (US);
Ying Crystal Shen, Fremont, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); H01J 37/04 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/265 (2013.01); H01J 37/045 (2013.01); H01J 37/266 (2013.01); H01J 37/28 (2013.01); H01J 2237/0044 (2013.01); H01J 2237/0048 (2013.01); H01J 2237/049 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/0455 (2013.01); H01J 2237/0458 (2013.01); H01J 2237/28 (2013.01); H01J 2237/2817 (2013.01);
Abstract
Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.