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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10770327 B1

PDFFull Text
Date of Patent:
Sep. 08, 2020

Filed:

Mar. 30, 2018

System and method for correcting non-ideal wafer topography

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Cheng-Mu Lin, Hsin-Chu, TW;

Chi-Hung Liao, Sanchong, TW;

Yi-Ming Dai, Hsinchu, TW;

Yueh Lin Yang, Hsin-Chu, TW;

Assignee:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Attorney:

Duane Morris LLP

Primary Examiner:

Obafemi O Sosanya

Int. Cl.
CPC ...
H01L 21/68 (2006.01); H04N 5/225 (2006.01); G06T 7/00 (2017.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/682 (2013.01); G06T 7/0004 (2013.01); H01L 21/67288 (2013.01); H01L 21/681 (2013.01); H04N 5/2256 (2013.01); G06T 2207/10152 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A scanner includes a light source configured to apply a light to a backside of a wafer. The light is reflected from the backside of the wafer. A first mirror is configured to receive the light from the backside of the wafer and reflect the light. A sensor is configured to receive the light from the first mirror and generate an output signal indicative of a backside topography of the wafer.

Find Patent Forward Citations

Lin, Cheng-Mu. (2020). System and method for correcting non-ideal wafer topography (U.S. Patent No. 10770327). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10770327

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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