The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2020
Filed:
Sep. 24, 2018
Yangtze Memory Technologies Co., Ltd., Wuhan, CN;
Xiaowang Dai, Wuhan, CN;
Zhenyu Lu, Wuhan, CN;
Qian Tao, Wuhan, CN;
Yushi Hu, Wuhan, CN;
Ji Xia, Wuhan, CN;
Zhaosong Li, Wuhan, CN;
Jialan He, Wuhan, CN;
YANGTZE MEMORY TECHNOLOGIES CO., LTD., Wuhan, CN;
Abstract
Embodiments of semiconductor structures for wafer flatness control and methods for using and forming the same are disclosed. In an example, a model indicative of a flatness difference of a wafer between a first direction and a second direction is obtained. The flatness difference is associated with one of a plurality of fabrication stages of a plurality of semiconductor devices on a front side of the wafer. A compensation pattern is determined for reducing the flatness difference based on the model. At the one of the plurality of the fabrication stages, a compensation structure is formed on a backside opposite to the front side of the wafer based on the compensation pattern to reduce the flatness difference.