The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2020
Filed:
Jan. 04, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Sidharth Bhatia, Santa Cruz, CA (US);
Zhili Zuo, Santa Clara, CA (US);
Hidehiro Kojiri, Sunnyvale, CA (US);
Anjana M. Patel, San Jose, CA (US);
Song-Moon Suh, Sunnyvale, CA (US);
Ganesh Balasubramanian, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 9/00 (2006.01); B08B 5/00 (2006.01); H01J 9/38 (2006.01); H01J 37/32 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32862 (2013.01); B08B 5/00 (2013.01); B08B 9/00 (2013.01); C23C 16/4405 (2013.01); C23C 16/4411 (2013.01); H01J 37/3244 (2013.01); H01J 37/32357 (2013.01); H01J 37/32522 (2013.01); H01J 2237/002 (2013.01); H01J 2237/3321 (2013.01);
Abstract
A method of cleaning a remote plasma source includes supplying a first cycle of one or more first cleaning gases to a remote plasma source. The method includes supplying a second cycle of one or more second cleaning gases to the remote plasma source. The method includes supplying one or more cooling fluids to one or more cooling conduits coupled with the remote plasma source.