The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2020
Filed:
Oct. 05, 2017
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3213 (2006.01); C08F 12/08 (2006.01); G03F 7/025 (2006.01); G03F 7/027 (2006.01); G03F 7/075 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/029 (2006.01); G03F 7/09 (2006.01); G03F 7/033 (2006.01); C08K 5/00 (2006.01); C08K 3/011 (2018.01);
U.S. Cl.
CPC ...
H01L 21/3213 (2013.01); C08F 12/08 (2013.01); G03F 7/0042 (2013.01); G03F 7/025 (2013.01); G03F 7/027 (2013.01); G03F 7/029 (2013.01); G03F 7/033 (2013.01); G03F 7/038 (2013.01); G03F 7/0752 (2013.01); G03F 7/094 (2013.01); C08K 3/011 (2018.01); C08K 5/0025 (2013.01);
Abstract
Provided is a material composition and method for that includes providing a substrate and forming a resist layer over the substrate. In various embodiments, the resist layer includes a metal complex including a radical generator, an organic core, and an organic solvent. By way of example, the organic core includes at least one cross-linker site. In some embodiments, an exposure process is performed to the resist layer. After performing the exposure process, the exposed resist layer is developed to form a patterned resist layer.