The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
Jan. 12, 2018
Applicant:
Applied Materials Israel, Ltd., Rehovot, IL;
Inventors:
Assignee:
Applied Materials Israel Ltd., Rehovot, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 15/08 (2006.01); G03F 7/20 (2006.01); G01B 15/00 (2006.01); B82Y 35/00 (2011.01);
U.S. Cl.
CPC ...
G01B 15/08 (2013.01); G01B 15/00 (2013.01); G03F 7/70625 (2013.01); B82Y 35/00 (2013.01); G01B 2210/56 (2013.01); G03F 7/70466 (2013.01);
Abstract
A method for monitoring a first nanometric structure formed by a multiple patterning process, the method may include performing a first plurality of measurements to provide a first plurality of measurement results; wherein the performing of the first plurality of measurements comprises illuminating first plurality of locations of a first sidewall of the first nanometric structure by oblique charged particle beams of different tilt angles; and processing, by a hardware processor, the first plurality of measurement results to determine a first attribute of the first nanometric structure.