The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2020

Filed:

Sep. 28, 2017
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Li-Chieh Hsu, Taichung, TW;

Fu-Shou Tsai, Keelung, TW;

Kun-Ju Li, Tainan, TW;

Po-Cheng Huang, Kaohsiung, TW;

Chun-Liang Liu, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/24 (2012.01); B24B 37/22 (2012.01); B24B 37/26 (2012.01);
U.S. Cl.
CPC ...
B24B 37/22 (2013.01); B24B 37/24 (2013.01); B24B 37/26 (2013.01); B24D 2205/00 (2013.01);
Abstract

The present invention provides a wafer polishing pad, the wafer polishing pad includes a polishing material layer, a plurality of recesses are formed on the top surface of the polishing material layer, and a warning element disposed within the polishing material layer, the warning element and the polishing material layer have different colors. The feature of the invention is that forming a warning element in the polishing material layer, when the visible state of the warning element is changed, for example, when the warning element appears, disappears or changes the shapes, it means that the wafer polishing pad needs to be replaced. In this way, the user can confirm the destroying situation of the wafer polishing pad easily, and also improving the manufacturing process efficiency.


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