The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2020
Filed:
Aug. 26, 2016
Asml Netherlands B.v., Veldhoven, NL;
Zomer Silvester Houweling, Utrecht, NL;
Eric Willem Felix Casimiri, Veldhoven, NL;
Tamara Druzhinina, Eindhoven, NL;
Paul Janssen, Eindhoven, NL;
Michael Alfred Josephus Kuijken, Son en Breugel, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Sicco Oosterhoff, Nuenen, NL;
Mária Péter, Eindhoven, NL;
Willem Joan Van Der Zande, Bussum, NL;
Pieter-Jan Van Zwol, Eindhoven, NL;
Beatrijs Louise Marie-Joseph Katrien Verbrugge, Kasterlee, BE;
Johannes Petrus Martinus Bernardus Vermeulen, Leende, NL;
David Ferdinand Vles, Eindhoven, NL;
Willem-Pieter Voorthuijzen, 's-Hertogenbosch, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.