The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2020

Filed:

Sep. 18, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Ruqiang Bao, Niskayuna, NY (US);

Hemanth Jagannathan, Niskayuna, NY (US);

Paul C. Jamison, Hopewell Junction, NY (US);

Choonghyun Lee, Rensselaer, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66795 (2013.01); H01L 21/76205 (2013.01); H01L 21/76224 (2013.01); H01L 29/785 (2013.01);
Abstract

According to an embodiment of the present invention, a semiconductor structure includes a semiconductor substrate and a plurality of fins located on the semiconductor substrate. The plurality of fins each independently includes a bottom fin portion, a top fin portion layer, and an isolated oxide layer located in between the bottom fin portion and the top fin portion layer in the y-direction parallel to the height of the plurality of fins. The isolated oxide layer includes a mixed oxide region located in between oxidized regions in an x-direction perpendicular to the height of the plurality of fins.


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