The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2020
Filed:
Jul. 27, 2018
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
John Hench, Los Gatos, CA (US);
Andrei Veldman, Sunnyvale, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/94 (2006.01); G01B 11/06 (2006.01); G01N 23/083 (2018.01); G06T 9/20 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01B 11/0641 (2013.01); G01N 21/9503 (2013.01); G01N 23/083 (2013.01); G06T 9/20 (2013.01);
Abstract
The embodiments disclosed herein can enable a target on a semiconductor wafer to be reconstructed and/or imaged. A surface of a target on a semiconductor wafer is measured using a wafer metrology tool. A voxel map of the surface is fixed to match geometry measurements and using scattering density of expected materials. Uniform scaling of the scattering density of all fixed surface voxels can occur.