The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2020

Filed:

Sep. 10, 2015
Applicant:

Hitachi High-tech Corporation, Minato-ku, Tokyo, JP;

Inventors:

Atsuko Yamaguchi, Tokyo, JP;

Masami Ikota, Tokyo, JP;

Kazuhisa Hasumi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/48 (2006.01); H04N 7/18 (2006.01); G06T 7/00 (2017.01); G01N 23/2251 (2018.01); H01L 21/67 (2006.01); G03F 1/44 (2012.01); G01N 21/956 (2006.01); G03F 7/20 (2006.01); G06T 7/64 (2017.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G01N 21/95692 (2013.01); G01N 23/2251 (2013.01); G03F 1/44 (2013.01); G03F 7/70625 (2013.01); G06T 7/0004 (2013.01); G06T 7/64 (2017.01); H01L 21/67288 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01); H01L 22/12 (2013.01);
Abstract

In order to provide an inspection device capable of quantitatively evaluating a pattern related to a state of a manufacturing process or performance of an element, it is assumed that an inspection device includes an image analyzing unit that analyzes a top-down image of a sample in which columnar patterns are formed at a regular interval, in which an image analyzing unitincludes a calculation unitthat obtains a major axis, a minor axis, an eccentricity, and an angle formed by a major axis direction with an image horizontal axis direction of the approximated ellipse as a first index and a Cr calculation unitthat obtains a circumferential length of an outline of a columnar pattern on the sample and a value obtained by dividing a square of the circumferential length by a value obtained by multiplying an area surrounded by the outline and 4π as a second index.


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