The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2020
Filed:
Jan. 26, 2017
Applicant:
Tokyo Electron Limited, Minato-ku, Tokyo, JP;
Inventors:
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); G01N 21/73 (2006.01); G01N 21/88 (2006.01); H01L 21/3065 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32935 (2013.01); G01N 21/73 (2013.01); G01N 21/88 (2013.01); H01J 37/3299 (2013.01); H01J 37/32128 (2013.01); H01J 37/32715 (2013.01); H01L 21/3065 (2013.01); H01L 22/26 (2013.01); H01J 2237/3341 (2013.01); Y02P 70/605 (2015.11);
Abstract
Provided are methods and systems for operation instability detection in a surface wave plasma source. In an embodiment a system for plasma processing may include a surface wave plasma source configured to generate a plasma field. The system may also include an optical sensor configured to generate information characteristic of optical energy collected in a region proximate to the surface wave plasma source. Additionally, the system may include a sensor logic unit configured to detect a region of instability proximate to the surface wave plasma source in response to the information generated by the optical sensor.