The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2020
Filed:
Jan. 18, 2019
Applied Materials, Inc., Santa Clara, CA (US);
Yu Gu, Singapore, SG;
Guan Huei See, Singapore, SG;
Peng Suo, Singapore, SG;
Prayudi Lianto, Singapore, SG;
Arvind Sundarrajan, Singapore, SG;
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
A method of processing a substrate includes depositing a layer of uncured polymer material atop a substrate to cover an exposed conductive layer on the substrate, exposing at least one area of the layer using a photolithography process, developing the layer in the photolithography process to remove a first portion of uncured polymer material from the at least one area, etching the layer with a dry etch process to remove a second portion of uncured polymer material from the at least one area to expose a top surface of the conductive layer and form a via in the layer, and curing the layer to form a cured polymer material.