The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2020

Filed:

Nov. 21, 2017
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Pouya Hashemi, White Plains, NY (US);

Mahmoud Khojasteh, Poughkeepsie, NY (US);

Tak H. Ning, Yorktown Heights, NY (US);

Alexander Reznicek, Troy, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/737 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 29/205 (2006.01); H01L 21/762 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
H01L 29/737 (2013.01); H01L 21/30617 (2013.01); H01L 21/76232 (2013.01); H01L 29/0649 (2013.01); H01L 29/205 (2013.01); H01L 29/66318 (2013.01);
Abstract

A bipolar junction transistor (LBJT) device that includes a base region of a first III-V semiconductor material having A first band gap; and emitter and collector regions present on opposing sides of the base region, wherein the emitter and collector regions are comprised of a second III-V semiconductor material having a wider band gap than the first III-V semiconductor material. A dielectric region is present underlying the base region, emitter region and the collect region. The dielectric region has an inverted apex geometry. The sidewalls of dielectric region that extend to the apex of the inverted apex geometry are present on facets of a supporting substrate III-V semiconductor material having a {110} crystalline orientation.


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