The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2020

Filed:

Dec. 29, 2017
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Bjorn Brauer, Beaverton, OR (US);

Junqing Huang, Fremont, CA (US);

Lisheng Gao, Saratoga, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 7/73 (2017.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06T 7/74 (2017.01); G06T 2207/10061 (2013.01); G06T 2207/20068 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Methods and systems are disclosed that provide nuisance reduction in images, such as semiconductor images that include one or more metal lines. A potential defect is correlated against pixel grey level intensity charts for two perpendicular axes. A position of the potential defect relative to a pattern, such as a metal line, is determined along the two axes. The potential defect can be classified as a defect of interest or nuisance event.


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