The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2020
Filed:
May. 24, 2018
Asml Netherlands B.v., Veldhoven, NL;
Janneke Ravensbergen, Eindhoven, NL;
Nitesh Pandey, Eindhoven, NL;
Zili Zhou, Eindhoven, NL;
Armand Eugene Albert Koolen, Nuth, NL;
Sebastianus Adrianus Goorden, Eindhoven, NL;
Bastiaan Onne Fagginger Auer, Eindhoven, NL;
Simon Gijsbert Josephus Mathijssen, Rosmalen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.