The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Feb. 15, 2019
Asml Netherlands B.v., Veldhoven, NL;
Marcel Beckers, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Ferdy Migchelbrink, Amersfoort, NL;
Elmar Evers, Almelo, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A barrier member configured to at least partly confine a liquid in a space between a projection system and a substrate table of an immersion lithographic system, the barrier member including: a liquid inlet configured to provide liquid to the space, a liquid outlet configured to remove liquid from the space, the liquid outlet having a porous member located in a surface configured toward face the substrate, a first gas inlet configured to provide gas to the space, the first gas inlet arranged to face toward the substrate and the first gas inlet located outward, relative to a central portion of the barrier member, of the porous member, and a second gas inlet configured to provide gas to the space, the second gas inlet arranged to face toward the substrate and the second gas inlet located outward, relative to the central portion, of the first gas inlet.