The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Nov. 30, 2018
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Abstract
A method of forming an overlay mark includes disposing a first feature of a plurality of first alignment segments extending along a first direction in a first layer, disposing a second feature of a plurality of second alignment segments extending along a second direction in a second layer over the first layer, and forming a third feature of a plurality of third alignment segments extending along the first direction and a plurality of fourth alignment segments extending along the second direction in a third layer over the second layer. In a plan view, each first alignment segment of the first alignment segments is adjacent to a corresponding third alignment segment of the third alignment segments along the first direction, and each second alignment segment of the second alignment segments is adjacent to a corresponding fourth alignment segment of the fourth alignment segments along the second direction.