The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2019
Filed:
Jul. 12, 2016
Applicant:
Air Products and Chemicals, Inc., Allentown, PA (US);
Inventors:
Krishna P. Murella, Phoenix, AZ (US);
Hongjun Zhou, Chandler, AZ (US);
Dnyanesh Chandrakant Tamboli, Gilbert, AZ (US);
Assignee:
VERSUM MATERIALS US, LLC, Tempe, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); C09G 1/02 (2006.01); H01L 21/3105 (2006.01); C09K 3/14 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30625 (2013.01); C09G 1/02 (2013.01); C09K 3/1436 (2013.01); C09K 3/1445 (2013.01); H01L 21/31053 (2013.01);
Abstract
Polishing compositions comprising ceria coated silica particles offer minimal topography, reduced oxide and nitride losses, while providing high oxide polish rates. These formulations are especially useful for polishing large structures typically used in 3D NAND device manufacturing.
Murella, Krishna. (2019). Composite abrasive particles for chemical mechanical planarization composition and method of use thereof (U.S. Patent No. 10418247). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10418247
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile