The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2019
Filed:
Aug. 22, 2016
Asml Netherlands B.v., Veldhoven, NL;
Simon Gijsbert Josephus Mathijssen, Rosmalen, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Nitesh Pandey, Eindhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Stefan Michiel Witte, Hoofddorp, NL;
Kjeld Sijbrand Eduard Eikema, Hoofddorp, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.