The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2019

Filed:

Mar. 31, 2017
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Ji Yong Park, Chandler, AZ (US);

Sri Chaitra J. Chavali, Chandler, AZ (US);

Siddharth K. Alur, Chandler, AZ (US);

Kyu Oh Lee, Chandler, AZ (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 37/10 (2006.01); H05K 3/46 (2006.01); H05K 3/00 (2006.01); B32B 37/06 (2006.01); H05K 3/02 (2006.01);
U.S. Cl.
CPC ...
B32B 37/10 (2013.01); B32B 37/06 (2013.01); H05K 3/0064 (2013.01); H05K 3/4602 (2013.01); B32B 2307/202 (2013.01); B32B 2309/02 (2013.01); B32B 2457/08 (2013.01); H05K 3/022 (2013.01); H05K 2203/0278 (2013.01); H05K 2203/068 (2013.01);
Abstract

A method for forming a substrate structure for an electrical component includes placing an electrically insulating laminate on a substrate and applying hot pressure to the electrically insulating laminate by a heatable plate. An average temperature of a surface temperature distribution within a center area of the heatable plate is higher than 80° C. during applying the hot pressure. Further, an edge area of the heatable plate laterally surrounds the center area and a temperature of the heatable plate within the edge area decreases from the center area towards an edge of the heatable plate during applying the hot pressure. A temperature at a location located vertically above an edge of the substrate during applying the hot pressure is at least 5° C. lower than the average temperature of the surface temperature distribution within the center area.


Find Patent Forward Citations

Park, Ji. (2019). Methods for forming a substrate structure for an electrical component and an apparatus for applying pressure to an electrically insulating laminate located on a core substrate (U.S. Patent No. 10384431). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10384431

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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