The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2019
Filed:
Jan. 19, 2018
International Business Machines Corporation, Armonk, NY (US);
Kafai Lai, Poughkeepsie, NY (US);
Hari V. Mallela, Poughquag, NY (US);
Hiroyuki Miyazoe, White Plains, NY (US);
Reinaldo A. Vega, Mahopac, NY (US);
Rajasekhar Venigalla, Hopewell Junction, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
Embodiments are directed to a method and resulting structures for smoothing the sidewall roughness of a post-etched film. A sacrificial layer is formed on a substrate. A patterned mask is formed by removing portions of the sacrificial layer to expose a surface of the substrate. The sidewalls of the patterned mask are smoothed and a target layer is formed over the patterned mask and the substrate. Portions of the target layer are removed to expose a surface of the patterned mask and the patterned mask is removed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile