The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2019

Filed:

Mar. 17, 2017
Applicant:

Senju Metal Industry Co., Ltd., Tokyo, JP;

Inventors:

Hiroyoshi Kawasaki, Tochigi-ken, JP;

Takahiro Roppongi, Tochigi-ken, JP;

Daisuke Soma, Tochigi-ken, JP;

Isamu Sato, Saitama-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 35/02 (2006.01); C22C 9/00 (2006.01); C25D 5/12 (2006.01); C25D 3/60 (2006.01); H01L 23/00 (2006.01); B23K 35/26 (2006.01); B23K 35/30 (2006.01); C22C 13/00 (2006.01); H01B 1/02 (2006.01); B22F 9/08 (2006.01); B22F 1/02 (2006.01); C25D 5/20 (2006.01); F16B 5/08 (2006.01); C25D 3/30 (2006.01); B23K 101/40 (2006.01); H05K 3/34 (2006.01);
U.S. Cl.
CPC ...
C25D 3/60 (2013.01); B22F 1/025 (2013.01); B22F 9/08 (2013.01); B23K 35/025 (2013.01); B23K 35/0222 (2013.01); B23K 35/0244 (2013.01); B23K 35/26 (2013.01); B23K 35/262 (2013.01); B23K 35/30 (2013.01); B23K 35/302 (2013.01); C22C 9/00 (2013.01); C22C 13/00 (2013.01); C25D 3/30 (2013.01); C25D 5/12 (2013.01); C25D 5/20 (2013.01); F16B 5/08 (2013.01); H01B 1/02 (2013.01); H01L 24/13 (2013.01); B22F 2301/10 (2013.01); B22F 2301/30 (2013.01); B23K 2101/40 (2018.08); H01L 2224/13014 (2013.01); H01L 2224/13147 (2013.01); H01L 2224/13582 (2013.01); H01L 2224/13611 (2013.01); H01L 2224/13655 (2013.01); H01L 2224/13657 (2013.01); H01L 2924/0105 (2013.01); H01L 2924/0109 (2013.01); H01L 2924/01082 (2013.01); H01L 2924/01083 (2013.01); H01L 2924/01092 (2013.01); H01L 2924/12042 (2013.01); H01L 2924/15321 (2013.01); H05K 3/3436 (2013.01); H05K 2201/0218 (2013.01); H05K 2201/10734 (2013.01);
Abstract

A Cu core ball and a method of manufacturing such a Cu core ball. Purity of the Cu internal ball is at least 99.9% and not greater than 99.995%. A total contained amount of Pb and/or Bi in impurity contained in the Cu ball is equal to or larger than 1 ppm. Its sphericity is at least 0.95. A solder plating film coated on the Cu ball is of Sn solder or a lead free solder alloy whose primary component is Sn. In the solder plating film, a contained amount of U is not more than 5 ppb and that of Th is not more than 5 ppb. A total alpha dose of the Cu ball and the solder plating film is not more than 0./0200 cph/cm2. An arithmetic average roughness of the Cu core ball is equal to or less than 0.3 μm.


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