The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2019
Filed:
Oct. 15, 2018
Carl Zeiss Smt Gmbh, Oberkochen, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
A method for aligning a mirror of a microlithographic projection exposure apparatus, according to one formulation, involves: recording a first partial interferogram between a wave reflected at a first mirror segment () and a reference wave reflected at a reference surface (), recording a second partial interferogram between a wave reflected at a second mirror segment () and a reference wave reflected at the reference surface, determining a phase offset between the first partial interferogram and the second partial interferogram, and aligning the first mirror segment and the second mirror segment in relation to one another in accordance with the determined phase offset, so that the distance of the relevant mirror segments () from a respective predetermined, hypothetical surface in the direction of the respective surface normal is less than λ/10 at each point on the mirror segments, where λ denotes the operating wavelength of the mirror.