The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2019
Filed:
Apr. 25, 2018
Globalfoundries Inc., Grand Cayman, KY;
Jiehui Shu, Clifton Park, NY (US);
David Paul Brunco, Latham, NY (US);
Pei Liu, Clifton Park, NY (US);
Shariq Siddiqui, Delmar, NY (US);
Jinping Liu, Ballston Lake, NY (US);
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
A method of forming contacts over active gates is provided. Embodiments include forming first and second gate structures over a portion of a fin; forming a first and second RSD in a portion of the fin between the first gate structures and between the first and the second gate structure, respectively; forming TS structures over the first and second RSD; forming a first cap layer over the first and second gate structures or over the TS structures; forming a metal oxide liner over the substrate, trenches formed; filling the trenches with a second cap layer; forming an ILD layer over the substrate; forming a CA through a first portion of the ILD and metal oxide layer down to the TS structures over the second RSD; and forming a CB through a second portion of the ILD and metal oxide layer down to the first gate structures.