The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
Sep. 08, 2011
Chung-chi Ko, Nantou, TW;
Chia-cheng Chou, Keelung, TW;
Shing-chyang Pan, Jhudong Township, TW;
Keng-chu Lin, Ping-Tung, TW;
Shwang-ming Jeng, Hsin-Chu, TW;
Chung-Chi Ko, Nantou, TW;
Chia-Cheng Chou, Keelung, TW;
Shing-Chyang Pan, Jhudong Township, TW;
Keng-Chu Lin, Ping-Tung, TW;
Shwang-Ming Jeng, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A method includes forming a metal hard mask over a low-k dielectric layer. The step of forming the metal hard mask includes depositing a sub-layer of the metal hard mask, and performing a plasma treatment on the sub-layer of the metal hard mask. The metal hard mask is patterned to form an opening. The low-k dielectric layer is etched to form a trench, wherein the step of etching is performed using the metal hard mask as an etching mask.