The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2019

Filed:

Jul. 01, 2014
Applicant:

Eo Technics Co., Ltd., Anyang-si, Gyeonggi-do, KR;

Inventors:

Sun Jung Kim, Gunpo-si, KR;

Jae Man Choi, Uiwang-si, KR;

Sung Beom Jung, Gwangmyeong-si, KR;

Jung Jin Seo, Anyang-si, KR;

Assignee:

EO TECHNICS CO., LTD., Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/00 (2014.01); H01L 21/00 (2006.01); H01L 21/67 (2006.01); H01L 23/544 (2006.01); B23K 26/03 (2006.01); H01L 21/268 (2006.01); H01L 21/78 (2006.01); B23K 26/08 (2014.01); B23K 26/359 (2014.01); B23K 101/40 (2006.01); B23K 103/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67282 (2013.01); B23K 26/0006 (2013.01); B23K 26/032 (2013.01); B23K 26/0869 (2013.01); B23K 26/359 (2015.10); H01L 21/268 (2013.01); H01L 21/78 (2013.01); H01L 23/544 (2013.01); B23K 2101/40 (2018.08); B23K 2103/56 (2018.08); H01L 2223/5446 (2013.01); H01L 2223/54433 (2013.01); H01L 2924/0002 (2013.01);
Abstract

Disclosed is a method for marking, by using a laser marker, a plurality of wafer dice divided by a wafer dicing process. The disclosed marking method for wafer dice comprises the steps of: setting a plurality of scan regions having a mutually overlapping portion on a wafer including the wafer dice; scanning the scan regions of the wafer a plurality of times by using a line scan camera; collecting position information of each of wafer dice located in regions in which the scan regions do not overlap; collecting, through image synthesis, position information of each of wafer dice located in regions in which the scan regions overlap; and marking, by using the laser marker, each of all the wafer dice of which the position information has been collected.


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