The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
Mar. 17, 2017
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Xunyuan Zhang, Albany, NY (US);
Frank Mont, Troy, NY (US);
Mark Raymond, Latham, NY (US);
Chengyu Niu, Niskayuna, NY (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01); H01L 21/70 (2006.01); H01L 29/45 (2006.01); H01L 29/66 (2006.01); H01L 21/28 (2006.01); H01L 29/08 (2006.01); H01L 21/768 (2006.01); H01L 21/285 (2006.01); H01L 29/78 (2006.01); H01L 29/417 (2006.01);
U.S. Cl.
CPC ...
H01L 29/45 (2013.01); H01L 21/28008 (2013.01); H01L 21/2855 (2013.01); H01L 21/28518 (2013.01); H01L 21/28568 (2013.01); H01L 21/76802 (2013.01); H01L 21/76846 (2013.01); H01L 21/76877 (2013.01); H01L 21/76889 (2013.01); H01L 29/0847 (2013.01); H01L 29/41783 (2013.01); H01L 29/665 (2013.01); H01L 29/66795 (2013.01); H01L 29/7851 (2013.01);
Abstract
A conductive source/drain contact is formed within a trench overlying a raised epitaxial source/drain junction. The conductive contact includes a conductive liner and a conductive fill material formed directly over the conductive liner. The conductive fill material is selected from a platinum group metal such as ruthenium. The conductive liner may be directionally deposited into the trench and is adapted to form a metal silicide in situ through a reaction with the epitaxial layer.