The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2019

Filed:

Apr. 05, 2017
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Guoheng Zhao, Palo Alto, CA (US);

J. K. Leong, San Jose, CA (US);

Michael Kirk, Los Altos Hills, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01N 21/95 (2006.01); G01N 21/94 (2006.01); G01N 21/64 (2006.01); G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9505 (2013.01); G01N 21/643 (2013.01); G01N 21/6445 (2013.01); G01N 21/8806 (2013.01); G01N 21/94 (2013.01); G01N 21/9501 (2013.01); G01N 2021/646 (2013.01); G01N 2021/8825 (2013.01); G01N 2021/8854 (2013.01);
Abstract

A inspection system includes an illumination source to generate an illumination beam, focusing elements to direct the illumination beam to a sample, a detector, collection elements configured to direct radiation emanating from the sample to the detector, a detection mode control device to image the sample in two or more detection modes such that the detector generates two or more collection signals based on the two or more detection modes, and a controller. Radiation emanating from the sample includes at least radiation specularly reflected by the sample and radiation scattered by the sample. The controller determines defect scattering characteristics associated with radiation scattered by defects on the sample based on the two or more collection signals. The controller also classifies the one or more particles according to a set of predetermined defect classifications based on the one or more defect scattering characteristics.


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